{"id":18,"date":"2018-06-12T20:32:46","date_gmt":"2018-06-12T20:32:46","guid":{"rendered":"https:\/\/blogs.cs.umbc.edu\/choalab\/?page_id=18"},"modified":"2018-06-12T21:34:34","modified_gmt":"2018-06-12T21:34:34","slug":"mocvd-growth","status":"publish","type":"page","link":"https:\/\/blogs.cs.umbc.edu\/choalab\/research\/mocvd-growth\/","title":{"rendered":"MOCVD Growth"},"content":{"rendered":"<p>MOCVD (metal-organic chemical vapor deposition) is a vapor-phase process for producing an epitaxial film of semiconductor deposited on a single-crystal substrate. MOCVD is a proven technique for obtaining high-quality, high-purity epitaxial layers in a variety of material systems. Unlike other vapor-phase epitaxy (VPE) techniques, MOCVD utilizes metalorganics, such as trimethylindium (TMIn), as sources for the Group III element. The Group V element is usually a hydride such as phosphine (PH3). Typically, the hydrides reacting with the metalorganic sources in a hydrogen ambient under appropriate temperature and pressure conditions produces molecules of the required semiconductor material, which deposit on the substrate, giving an epitaxial layer.<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-medium wp-image-167\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image006-300x223.jpg\" alt=\"\" width=\"300\" height=\"223\" srcset=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image006-300x223.jpg 300w, https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image006.jpg 538w\" sizes=\"auto, (max-width: 300px) 100vw, 300px\" \/><br \/>\nMOCVD Crystal Growth Systems<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-137\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image020-1.jpg\" alt=\"\" width=\"176\" height=\"125\" \/><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-133\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image021.jpg\" alt=\"\" width=\"166\" height=\"125\" \/><br \/>\n<img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-130\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image022.jpg\" alt=\"\" width=\"176\" height=\"131\" \/><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-full wp-image-128\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image023-1.jpg\" alt=\"\" width=\"166\" height=\"131\" \/><br \/>\nCleanroom Fabrication and Testing Facility<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-122 size-full\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image025-1.jpg\" alt=\"\" width=\"576\" height=\"341\" srcset=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image025-1.jpg 576w, https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image025-1-300x178.jpg 300w\" sizes=\"auto, (max-width: 576px) 100vw, 576px\" \/><br \/>\nSchematic diagram of the MOCVD system at UMBC<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"alignnone wp-image-117 size-full\" src=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image026.png\" alt=\"\" width=\"690\" height=\"367\" srcset=\"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image026.png 690w, https:\/\/blogs.cs.umbc.edu\/choalab\/wp-content\/uploads\/sites\/15\/2018\/06\/image026-300x160.png 300w\" sizes=\"auto, (max-width: 690px) 100vw, 690px\" \/><br \/>\nPhysical properties of various metalorganic sources used in MOCVD<\/p>\n","protected":false},"excerpt":{"rendered":"<p>MOCVD (metal-organic chemical vapor deposition) is a vapor-phase process for producing an epitaxial film of semiconductor deposited on a single-crystal substrate. MOCVD is a proven technique for obtaining high-quality, high-purity epitaxial layers in a variety of material systems. Unlike other vapor-phase epitaxy (VPE) techniques, MOCVD utilizes metalorganics, such as trimethylindium (TMIn), as sources for the &hellip; <a href=\"https:\/\/blogs.cs.umbc.edu\/choalab\/research\/mocvd-growth\/\" class=\"more-link\">Continue reading <span class=\"screen-reader-text\">MOCVD Growth<\/span> <span class=\"meta-nav\">&rarr;<\/span><\/a><\/p>\n","protected":false},"author":30,"featured_media":0,"parent":14,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-18","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/pages\/18","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/users\/30"}],"replies":[{"embeddable":true,"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/comments?post=18"}],"version-history":[{"count":5,"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/pages\/18\/revisions"}],"predecessor-version":[{"id":210,"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/pages\/18\/revisions\/210"}],"up":[{"embeddable":true,"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/pages\/14"}],"wp:attachment":[{"href":"https:\/\/blogs.cs.umbc.edu\/choalab\/wp-json\/wp\/v2\/media?parent=18"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}